The 17th International Conference on the Formation of Semiconductor Interfaces (ICFSI-17) will be held in Shanghai, the largest city of China. With a history of more than 700 years, Shanghai is one of the most important cultural, commercial, financial, industrial and communications centers of China. Shanghai also has one of the world's busiest ports, and has become the largest cargo port in the world. This 17th conference of the ICFSI series, started in 1985 by G. Le Lay, has the intention, as all previous meetings, to give a broadband overview over the latest developments of modern phenomena at surfaces, interfaces, and nanostructures based on semiconductors or insulators ranging from the characterization at the atomic scale to prospects of electronic, spintronic, photonic and photovoltaic applications. The aim for this conference is to bring together leading experts from various fields and disciplines in order to stimulate the exchange of knowledge and promote the capabilities of this interdisciplinary research topic.
ICFSI-17 will be held from Jun. 24th to 28th, 2019 at the Shanghai Tianping Hotel, near Shanghai Jiaotong University (Xuhui Campus).
May 20, 2019 Early Registration Deadline
May 1, 2019 Abstract Submission Deadline